| Wednesday, November 13, 2019 |
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CHAIRMAN: Anton Keppel, SCREEN Semiconductor Solutions Co., Ltd.
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| 10:00 |
Introduction and Welcome |
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Dr. Martin Hollfelder
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Session 1. More than Moore, Power, Beyond CMOS
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| 10:10 |
1.2 AXCELIS – Dr. Dwight Roh |
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Advanced Implant technology for More than Moore, Power and beyond CMOS
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| 10:30 |
1.1 SCREEN LASSE - Dr. Fulvio Mazzamuto |
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Ultrafast Laser Annealing for Power devices
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| 10:50 |
1.3 SOITEC – Dr. Nicolas Daval |
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SMART Cut™ applied for compound semiconductor
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Session 2. SCREEN R&D and JDP Collaboration
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| 11:10 |
2.1 IMEC - Dr. Frank Holsteyns |
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Wet Process Challenges for Advanced Logic Device Fabrication
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| 11:30 |
2.2 CEA-Leti – Dr. Sebastien Kerdiles |
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Nanosecond Laser Annealing for 3D integration
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Session 3. Equipment Presentation
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| 11:50 |
3.1 SCREEN – Mark Goeke |
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Polyimide Coat/Develop track DT-3000 for power application
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| 12:10 |
3.2 SCREEN – Alessandro Rossi |
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ZI-2000 for SiC and LT/LN wafer inspection
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