Thursday, November 20, 2025 | |
Materials |
Materials Innovation |
12:40 | Opening Remarks by Session Chair, Veronique Sousa, Head of Laboratory for Power Semiconductor Devices, CEA-leti |
12:45 | Accelerating nanoelectronic device innovation through atomistic simulation–driven material screening |
Geoffrey Pourtois, Fellow, Imec Accelerating nanoelectronic device innovation through atomistic simulation–driven material screening![]() Abstract Biography |
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13:05 | Innovative AMC Filtration solutions for future semiconductor production challenges |
Manfred Zoermer, Mann+Hummel Molecular GmbH Innovative AMC Filtration solutions for future semiconductor production challenges![]() Abstract Biography |
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13:25 | Advances in AlScN Thin Films Deposited by Lam Research Pulsed Laser Deposition Platform |
Matthijn Dekkers, Director Engineering Pulsed Laser Deposition technique (PLD), Lam Research Advances in AlScN Thin Films Deposited by Lam Research Pulsed Laser Deposition Platform![]() Abstract Biography |
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13:35 | Reserved for Soitec |
13:55 | „Materials, Innovations for Generations” |
Michael Joerger, Head of Business Line Power Electronic Materials, Heraeus Electronics GMBH „Materials, Innovations for Generations”Abstract Biography |
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14:15 | Closing Remarks by Session Chair, Veronique Sousa, Head of Laboratory for Power Semiconductor Devices, CEA-leti |